TW224077B - - Google Patents

Info

Publication number
TW224077B
TW224077B TW080103864A TW80103864A TW224077B TW 224077 B TW224077 B TW 224077B TW 080103864 A TW080103864 A TW 080103864A TW 80103864 A TW80103864 A TW 80103864A TW 224077 B TW224077 B TW 224077B
Authority
TW
Taiwan
Application number
TW080103864A
Other languages
Chinese (zh)
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24270461&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW224077(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of TW224077B publication Critical patent/TW224077B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
TW080103864A 1990-08-16 1991-05-17 TW224077B (en])

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/568,230 US5043002A (en) 1990-08-16 1990-08-16 Method of making fused silica by decomposing siloxanes

Publications (1)

Publication Number Publication Date
TW224077B true TW224077B (en]) 1994-05-21

Family

ID=24270461

Family Applications (1)

Application Number Title Priority Date Filing Date
TW080103864A TW224077B (en]) 1990-08-16 1991-05-17

Country Status (6)

Country Link
US (2) US5043002A (en])
EP (1) EP0471139B1 (en])
JP (1) JP2683727B2 (en])
CA (1) CA2037102C (en])
DE (1) DE69123659T2 (en])
TW (1) TW224077B (en])

Families Citing this family (138)

* Cited by examiner, † Cited by third party
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WO1994017003A1 (en) * 1990-09-21 1994-08-04 Allied-Signal Inc. Ceramic fiber reinforced silicon carboxide composite with adjustable dielectric properties
US5266533A (en) * 1991-04-12 1993-11-30 Allied-Signal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
EP0654016B1 (en) * 1991-04-12 1997-10-29 AlliedSignal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
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US5296012A (en) * 1992-12-28 1994-03-22 Corning Incorporated Method of making optical waveguide preforms
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US5910371A (en) 1996-01-04 1999-06-08 Francel; Josef Composite glass article and method of manufacture
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WO1997032821A1 (en) * 1996-03-05 1997-09-12 Corning Incorporated Method of increasing the initial transmittance of optical glass
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US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
JP2000517284A (ja) * 1996-08-29 2000-12-26 コーニング インコーポレイテッド 石英ガラスのレーザ誘起圧密決定方法
JP2001502312A (ja) * 1996-10-08 2001-02-20 コーニング インコーポレイテッド シロキサン原料のゲル化を阻害する方法およびゲル化の阻害された原料
BR9707515A (pt) 1996-12-16 1999-07-27 Corning Inc Estoque de alimentac o de formac o de sílica dopada com germânio e processo
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US6174509B1 (en) * 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
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KR100548198B1 (ko) * 1997-04-18 2006-02-01 코닝 인코포레이티드 실록산의 정제방법
AU743831B2 (en) * 1997-07-08 2002-02-07 Corning Incorporated Germanium chloride and siloxane feedstock for forming silica glass and method
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater
CA2295684A1 (en) * 1997-07-21 1999-01-28 Corning Incorporated Methods and apparatus for producing low flow rates of feedstock vapors
EP1030822B1 (en) * 1997-09-24 2010-06-23 Corning Incorporated FUSED SiO2-TiO2 GLASS METHOD
US6094940A (en) * 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
JPH11116247A (ja) * 1997-10-09 1999-04-27 Nikon Corp 合成石英ガラス製造方法
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US6546757B1 (en) 1998-07-28 2003-04-15 Brown University Research Foundation Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing
EP0978487A3 (en) 1998-08-07 2001-02-21 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
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US6260385B1 (en) 1998-08-07 2001-07-17 Corning Incorporated Method and burner for forming silica-containing soot
US6672106B1 (en) 1998-08-07 2004-01-06 Corning Incorporated Method and apparatus for forming soot for the manufacture of glass
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US5970751A (en) * 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
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US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
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US6140546A (en) * 1999-06-04 2000-10-31 Phillips Petroleum Company Hydrocarbon dehydrocyclization process
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US6410192B1 (en) 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6176588B1 (en) 1999-12-14 2001-01-23 Corning Incorporated Low cost light weight mirror blank
US6314766B1 (en) * 2000-01-19 2001-11-13 Corning Incorporated Apparatus for minimizing air infiltration in the production of fused silica glass
US6418756B1 (en) 2000-01-28 2002-07-16 Corning Incorporated Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
US6598425B1 (en) 2000-03-08 2003-07-29 Corning Incorporated Method for collecting soot
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US6403508B1 (en) 2000-05-31 2002-06-11 Corning Incorporated Fused silica with constant induced absorption
US6988378B1 (en) * 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US6387511B1 (en) * 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6378337B1 (en) * 2000-09-15 2002-04-30 Corning Incorporated Method for producing bulk fused silica
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US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
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US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
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JP4154563B2 (ja) * 2001-07-23 2008-09-24 信越化学工業株式会社 シリカ含有複合酸化物球状微粒子及びその製造方法
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JP2005503316A (ja) * 2001-09-27 2005-02-03 コーニング インコーポレイテッド 石英ガラス生産のための改善された方法及び炉
US6763683B2 (en) 2001-10-23 2004-07-20 Corning Incorporated Method for pure, fused oxide
US8037717B2 (en) * 2001-10-26 2011-10-18 Corning Incorporated Methods and apparatus for pulsed doping or drying a soot preform
US20030104209A1 (en) * 2001-11-30 2003-06-05 Bellman Robert A. Precursor and method of growing doped glass films
US6832493B2 (en) * 2002-02-27 2004-12-21 Corning Incorporated High purity glass bodies formed by zero shrinkage casting
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AU633206B2 (en) 1993-01-21
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EP0471139B1 (en) 1996-12-18
CA2037102C (en) 1997-10-21
DE69123659T2 (de) 1997-06-05
EP0471139A2 (en) 1992-02-19
DE69123659D1 (de) 1997-01-30
JP2683727B2 (ja) 1997-12-03
JPH04270130A (ja) 1992-09-25
AU7535591A (en) 1992-02-27
US5043002A (en) 1991-08-27
EP0471139A3 (en) 1993-01-07

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